Please use this identifier to cite or link to this item: http://hdl.handle.net/10773/6084
Title: Structural and optical properties of nitrogen doped ZnO films
Author: Alves, E.
Franco, N.
Barradas, N.P.
Munnik, F.
Monteiro, T.
Peres, M.
Wang, J.
Martins, R.
Fortunato, E.
Keywords: ZnO films
Nitrogen doping
RF magnetron sputtering
Issue Date: 28-Mar-2009
Publisher: Elsevier
Abstract: In this study we discuss the structural and optical properties of ZnO films doped with nitrogen, a potential p-type dopant. The films were deposited by magnetron sputtering using different conditions and substrates. The composition and structural properties of the films were studied combining X-ray diffraction (XRD), Rutherford backscattering (RBS), and heavy ion elastic recoil detection analysis (HI-ERDA). The results show an improvement of the quality of the films deposited on sapphire with increasing radio-frequency (RF) power with a preferentially growth along the c-axis. The ERDA analysis reveals the presence of H in the films and a homogeneous composition over the entire thickness. The photoluminescence of annealed samples evidences an improvement on the optical quality as identified by the well structured near band edge recombination.
Description: Partilhar documento na coleção da comunidade Laboratório Associado I3N
Peer review: yes
URI: http://hdl.handle.net/10773/6084
DOI: 10.1016/j.vacuum.2009.03.022
ISSN: 0042-207X
Appears in Collections:DFis - Artigos
I3N-FSCOSD - Artigos

Files in This Item:
File Description SizeFormat 
Vacuum.pdfversão pdf do editor550.92 kBAdobe PDFrestrictedAccess


FacebookTwitterLinkedIn
Formato BibTex MendeleyEndnote Degois 

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.