Please use this identifier to cite or link to this item: http://hdl.handle.net/10773/20473
Title: Block Copolymer-Assisted Nanopatterning of Porous Lead Titanate Thin Films for Advanced Electronics
Author: Castro, Alichandra
Ferreira, Paula
Vilarinho, Paula M.
Keywords: CHEMICAL SOLUTION DEPOSITION
FERROELECTRIC-FILMS
RAMAN-SCATTERING
NANOSCALE
NANOPOROSITY
FABRICATION
PBTIO3
PIEZO
TIO2
Issue Date: 2016
Publisher: AMER CHEMICAL SOC
Abstract: Chemical self-assembly of functional ferroelectric PbTiO3 using amphiphilic block copolymers is used to prepare low-cost nanopatterned porous thin films with nanostructure control down to similar to 22 nm of lateral size. The approach developed in this work is highly effective in patterning PbTiO3 and avoids costly high-resolution lithography techniques and harmful etching processes. Nanopatterned films presenting a honeycomb-like arrangement of pores with diameters between 80 and 140 nm are obtained. The ordering and thickness of the films are discussed as a function of the precursors concentration and withdrawal rate used for films dip-coating. The nanopatterned porous films with thickness of 22 mn exhibit tetragonal perovskite crystallographic phase and ferroelectric response at the nanoscale. These films display vertical open porosity from the film surface to the substrate, leading to nearly 50% of the substrate surface being accessible to further functionalization toward low-cost, sustainable, multifunctional composites for the microelectronics industry.
Peer review: yes
URI: http://hdl.handle.net/10773/20473
DOI: 10.1021/acs.jpcc.6b02581
ISSN: 1932-7447
Publisher Version: 10.1021/acs.jpcc.6b02581
Appears in Collections:CICECO - Artigos



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