Please use this identifier to cite or link to this item: http://hdl.handle.net/10773/6687
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dc.contributor.authorPeres, M.pt
dc.contributor.authorNeves, A.J.pt
dc.contributor.authorMonteiro, T.pt
dc.contributor.authorMagalhães, S.pt
dc.contributor.authorFranco, N.pt
dc.contributor.authorLorenz, K.pt
dc.contributor.authorAlves, E.pt
dc.contributor.authorDamilano, B.pt
dc.contributor.authorMassies, J.pt
dc.contributor.authorDussaigne, A.pt
dc.contributor.authorGrandjean, N.pt
dc.date.accessioned2012-02-20T15:49:16Z-
dc.date.issued2010-
dc.identifier.issn1533-4880pt
dc.identifier.urihttp://hdl.handle.net/10773/6687-
dc.description.abstractGaN/AIN structures made of GaN quantum dots (QDs) separated by AIN spacer layers, were doped with Europium by ion implantation. Rutherford Backscattering/Channelling measurements showed that Eu is incorporated mainly on near-substitutional cation sites within the superlattice region. Only slight deterioration of the crystal quality and no intermixing of the different layers are observed after implantation and annealing. After thermal annealing, photoluminescence associated with Eu3+ ions was observed. From its behaviour under different photon energy excitation and sample temperature we concluded that the Eu-related emitting centres are located inside the GaN QDs or dispersed in the GaN and AIN buffer or spacer layers. The 624 nm PL line, associated with Eu-doped GaN QDs, shows very low thermal quenching, suggesting recombination of confined carriers through rare-earth ion excitation.pt
dc.description.sponsorshipFCT - POCI/FIS/57550/2004pt
dc.language.isoengpt
dc.publisherASPpt
dc.relation.urihttp://www.scopus.com/inward/record.url?eid=2-s2.0-77954983515&partnerID=40&md5=42e9e3dc18cb0dbd2974c5c37cdf9c66
dc.rightsrestrictedAccesspor
dc.subjectGaNpt
dc.subjectIon implantationpt
dc.subjectPLpt
dc.subjectPLEpt
dc.subjectQuantum dotspt
dc.subjectRare earthspt
dc.subjectRBSpt
dc.titleOptical and structural properties of an Eu implanted Gallium Nitride quantum Dots/Aluminium Nitride Superlatticept
dc.typearticlept
dc.peerreviewedyespt
ua.distributioninternationalpt
degois.publication.firstPage2473pt
degois.publication.issue4
degois.publication.issue4pt
degois.publication.lastPage2478pt
degois.publication.titleJournal of Nanoscience and Nanotechnologypt
degois.publication.volume10pt
dc.date.embargo10000-01-01-
dc.identifier.doi10.1166/jnn.2010.1430*
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