Please use this identifier to cite or link to this item: http://hdl.handle.net/10773/18184
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dc.contributor.authorTsui, H C Lpt
dc.contributor.authorGoff, L Ept
dc.contributor.authorRhode, S Kpt
dc.contributor.authorPereira, Spt
dc.contributor.authorBeere, H Ept
dc.contributor.authorFarrer, Ipt
dc.contributor.authorNicoll, C Apt
dc.contributor.authorRitchie, D Apt
dc.contributor.authorMoram, M Apt
dc.date.accessioned2017-07-31T14:55:34Z-
dc.date.available2017-07-31T14:55:34Z-
dc.date.issued2015-
dc.identifier.issn1077-3118pt
dc.identifier.urihttp://hdl.handle.net/10773/18184-
dc.description.abstractOptical transmittance measurements on epitaxial, phase-pure, wurtzite-structure ScxGa1−xN films with 0 ≤ x ≤ 0.26 showed that their direct optical band gaps increased from 3.33 eV to 3.89 eV with increasing x, in agreement with theory. These films contained I1- and I2-type stacking faults. However, the direct optical band gaps decreased from 3.37 eV to 3.26 eV for ScxGa1−xN films, which additionally contained nanoscale lamellar inclusions of the zinc-blende phase, as revealed by aberration-corrected scanning transmission electron microscopy. Therefore, we conclude that the apparent reduction in ScxGa1−xN band gaps with increasing x is an artefact resulting from the presence of nanoscale zinc-blende inclusions.pt
dc.language.isoengpt
dc.publisherAIP Publishingpt
dc.rightsopenAccesspor
dc.titleBand gaps of wurtzite ScxGa1-xN alloyspt
dc.typearticle
dc.peerreviewedyespt
ua.distributioninternationalpt
ua.event.titleApplied Physics Letters
degois.publication.issue13
degois.publication.titleApplied Physics Letterspt
degois.publication.volume106pt
dc.identifier.doi10.1063/1.4916679pt
Appears in Collections:CICECO - Artigos

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