Laser assisted flow deposition: a new method to grow ZnO

Please use this identifier to cite or link to this item: http://hdl.handle.net/10773/9587

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DC Field	Value	Language
dc.contributor.author	Rodrigues, J.	pt
dc.contributor.author	Soares, M.R.N.	pt
dc.contributor.author	Fernandes, A.J.S.	pt
dc.contributor.author	Monteiro, T.	pt
dc.contributor.author	Costa, F.M.	pt
dc.date.accessioned	2013-01-24T13:22:28Z	-
dc.date.available	2013-11-27T08:46:04Z	-
dc.date.issued	2012-08	-
dc.identifier.issn	1431-9276	pt
dc.identifier.uri	http://hdl.handle.net/10773/9587	-
dc.description.abstract	Zinc oxide (ZnO) has been one of the most studied materials in the last decades. Either as bulk material, epilayers or nanostructures, this direct wide band gap semiconductor is known to possess great potential for fundamental science and modern technology applications.	pt
dc.language.iso	eng	pt
dc.publisher	Cambridge University Press	pt
dc.rights	openAccess	por
dc.subject	ZnO	pt
dc.subject	Laser assisted flow deposition	pt
dc.title	Laser assisted flow deposition: a new method to grow ZnO	pt
dc.type	article	pt
dc.peerreviewed	yes	pt
ua.distribution	international	pt
degois.publication.firstPage	87	pt
degois.publication.issue	Supplement S5	pt
degois.publication.lastPage	88	pt
degois.publication.title	Microscopy and Microanalysis	pt
degois.publication.volume	18	pt
dc.identifier.doi	10.1017/S1431927612013098	pt
Appears in Collections:	DFis - Artigos I3N-FSCOSD - Artigos

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