Please use this identifier to cite or link to this item: http://hdl.handle.net/10773/6195
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dc.contributor.authorMonteiro, T.pt
dc.contributor.authorSoares, J.pt
dc.contributor.authorCorreia, M.R.pt
dc.contributor.authorAlves, E.pt
dc.date.accessioned2012-02-10T13:54:03Z-
dc.date.available2012-02-10T13:54:03Z-
dc.date.issued2001-03-
dc.identifier.issn0021-8979pt
dc.identifier.urihttp://hdl.handle.net/10773/6195-
dc.description.abstractEr-related luminescence near 1.54 mm ~;805 meV! is observed under below band gap excitation at 4.2 K in GaN:Er and GaN:Er,O implanted samples. The spectrum of the recovered damage samples is a multiline structure. So far, these lines are the sharpest ones reported for GaN. Well-resolved green and red luminescences are observed in implanted samples. The dependence of luminescence on the excitation energy as well as the influence of different nominal fluence and annealing conditions is discussed. Combining the results obtained from photoluminescence and Rutherford backscattering spectrometry, different lattice sites for the optical active Er-related centers are identified.pt
dc.language.isoengpt
dc.publisherAIPpt
dc.relation.urihttp://www.scopus.com/inward/record.url?eid=2-s2.0-0035356782&partnerID=40&md5=0db5f5a6038ff14098c1a632a74f67cf
dc.rightsopenAccesspor
dc.subjectoxygenpt
dc.subjecterbiumpt
dc.subjectgallium compoundspt
dc.subjectIII-V semiconductorspt
dc.subjectannealingpt
dc.subjectphotoluminescencept
dc.subjectRutherford backscatteringpt
dc.subjection implantationpt
dc.subjectimpurity statespt
dc.titleGreen, red and infrared Er-related emission in implanted GaN:Er and GaN:Er,O samplespt
dc.typearticlept
dc.peerreviewedyespt
ua.distributioninternationalpt
degois.publication.firstPage6183pt
degois.publication.issue11pt
degois.publication.issue11 I
degois.publication.lastPage6188pt
degois.publication.titleJournal of Applied Physicspt
degois.publication.volume89pt
dc.relation.publisherversionlink.aip.org/link/doi/10.1063/1.1369404*
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