Please use this identifier to cite or link to this item: http://hdl.handle.net/10773/5633
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dc.contributor.authorPeres, Marcopt
dc.contributor.authorMagalhães, Sérgiopt
dc.contributor.authorFranco, N.pt
dc.contributor.authorSoares, Manuelpt
dc.contributor.authorNeves, Armandopt
dc.contributor.authorAlves, E.pt
dc.contributor.authorLorenz, K.pt
dc.contributor.authorMonteiro, Teresapt
dc.date.accessioned2012-01-31T11:40:54Z-
dc.date.issued2009-02-
dc.identifier.issn0026-2692pt
dc.identifier.urihttp://hdl.handle.net/10773/5633-
dc.descriptionPartilhar documento na coleção da comunidade Laboratório Associado I3Npt
dc.description.abstractThe effects of the AlN molar fraction on structural and optical properties of praseodymium implanted AlxGa1−xN (0⩽x⩽1) layers were investigated. Using photoluminescence and excitation luminescence techniques we are able to observe the intra-4f23P1→3H5 (526 nm) and 3P0→3F2 (652 nm) transitions of the Pr3+ ion. The red emission peak position shifts to lower energies with increasing Al content in the alloys. The peak full-width at half-maximum increases with the Al content up to x=0.7 due to disorder effects. The implantation damage and Pr-incorporation was investigated by Rutherford backscattering spectrometry doing channelling measurements along the 〈0 0 0 1〉 direction. X-ray diffraction reciprocal space maps show an expansion of the c lattice parameter in the implanted region which is reversed after thermal annealing at 1300 °C.pt
dc.description.sponsorshipFCT-POCI/FIS/57550/2004pt
dc.language.isoengpt
dc.publisherElsevierpt
dc.relation.urihttp://www.scopus.com/inward/record.url?eid=2-s2.0-58749106418&partnerID=40&md5=4d9ac579db817feaff1ea63a67e7d15f
dc.rightsrestrictedAccesspor
dc.subjectAlGaNpt
dc.subjectRare earth dopingpt
dc.subjectXRDpt
dc.subjectRBS/Cpt
dc.subjectPLpt
dc.subjectPLEpt
dc.titleInfluence of the AlN molar fraction on the structural and optical properties of praseodymium-doped AlxGa1-xN (0≤x≤1) alloyspt
dc.typearticlept
dc.peerreviewedyespt
ua.distributioninternationalpt
degois.publication.firstPage377pt
degois.publication.issue2pt
degois.publication.issue2
degois.publication.lastPage380pt
degois.publication.titleMicroelectronics Journalpt
degois.publication.volume40pt
dc.date.embargo10000-01-01-
dc.identifier.doi10.1016/j.mejo.2008.07.032*
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