Please use this identifier to cite or link to this item: http://hdl.handle.net/10773/20495
Title: Composition measurement of epitaxial ScxGa1-xN films
Author: Tsui, H. C. L.
Goff, L. E.
Barradas, N. P.
Alves, E.
Pereira, S.
Palgrave, R. G.
Davies, R. J.
Beere, H. E.
Farrer, I.
Ritchie, D. A.
Moram, M. A.
Keywords: SCANDIUM NITRIDE FILMS
THIN-FILMS
BAND-GAP
INGAN EPILAYERS
GROWTH
SCGAN
MICROSTRUCTURE
SURFACE
PLASMA
LAYERS
Issue Date: 2016
Publisher: IOP PUBLISHING LTD
Abstract: Four different methods for measuring the compositions of epitaxial ScxGa1-xN films were assessed and compared to determine which was the most reliable and accurate. The compositions of epitaxial ScxGa1-xN films with 0 <= x <= 0.26 were measured directly using Rutherford backscattering (RBS) and x-ray photoelectron spectroscopy (XPS), and indirectly using c lattice parameter measurements from x-ray diffraction and c/a ratio measurements from electron diffraction patterns. RBS measurements were taken as a standard reference. XPS was found to underestimate the Sc content, whereas c lattice parameter and c/a ratio were not reliable for composition determination due to the unknown degree of strain relaxation in the film. However, the Sc flux used during growth was found to relate linearly with x and could be used to estimate the Sc content.
Peer review: yes
URI: http://hdl.handle.net/10773/20495
DOI: 10.1088/0268-1242/31/6/064002
ISSN: 0268-1242
Publisher Version: 10.1088/0268-1242/31/6/064002
Appears in Collections:CICECO - Artigos

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