Please use this identifier to cite or link to this item:
|Title:||Tackling Polar Response in Oxygen Deficient KTaO3 Thin Films|
|Author:||Mota, D. A.|
Perez de la Cruz, J.
Vilarinho, P. M.
Tavares, P. B.
Agostinho Moreira, J.
|Publisher:||TAYLOR & FRANCIS LTD|
|Abstract:||Oxygen deficient KTaO3 thin films were grown by RF magnetron sputtering on Si/SiO2/Ti/Pt substrates. Room temperature X-ray diffraction shows that they are under a compressive strain of 2.3%. Leakage current results reveal the presence of a conductive mechanism, following Poole-Frenkel formalism. The existence of a polar response below T-pol approximate to 367 degrees C was ascertained by dielectric, polarization, and depolarization current measurements. A Cole-Cole dipolar relaxation was evidenced which is associated with oxygen vacancies induced dipoles. After annealing the films in an oxygen atmosphere above T-pol, the aforementioned polar response is suppressed, due to significant oxygen vacancies reduction.|
|Appears in Collections:||CICECO - Artigos|
Files in This Item:
|Tackling Polar Response in Oxygen Deficient KTaO 3Thin Films_10.108000150193.2014.893804.pdf||589.61 kB||Adobe PDF||Request a copy|
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.