DSpace
 
  Repositório Institucional da Universidade de Aveiro > Departamento de Física > FIS - Artigos >
 Functionalizing self-assembled GaN quantum dot superlattices by Eu-implantation
Please use this identifier to cite or link to this item http://hdl.handle.net/10773/6127

title: Functionalizing self-assembled GaN quantum dot superlattices by Eu-implantation
authors: Magalhães, S.
Peres, M.
Fellmann, V.
Daudin, B.
Neves, A.J.
Alves, E.
Monteiro, T.
Lorenz, K.
keywords: Aluminium compounds
Annealing
Europium
Gallium compounds
III-V semiconductors
Ion implantation
Self-assembly
Semiconductor quantum dots
Semiconductor superlattices
Wide band gap semiconductors
issue date: 21-Oct-2010
publisher: AIP
abstract: Self-assembled GaN quantum dots (QDs) stacked in superlattices (SL) with AlN spacer layers were implanted with Europium ions to fluences of 1013, 1014, and 1015 cm−2. The damage level introduced in the QDs by the implantation stays well below that of thick GaN epilayers. For the lowest fluence, the structural properties remain unchanged after implantation and annealing while for higher fluences the implantation damage causes an expansion of the SL in the [0001] direction which increases with implantation fluence and is only partly reversed after thermal annealing at 1000 °C. Nevertheless, in all cases, the SL quality remains very good after implantation and annealing with Eu ions incorporated preferentially into near-substitutional cation sites. Eu3+ optical activation is achieved after annealing in all samples. In the sample implanted with the lowest fluence, the Eu3+ emission arises mainly from Eu incorporated inside the QDs while for the higher fluences only the emission from Eu inside the AlN-buffer, capping, and spacer layers is observed. © 2010 American Institute of Physics
URI: http://hdl.handle.net/10773/6127
ISSN: 0021-8979
publisher version/DOI: link.aip.org/link/doi/10.1063/1.3496624
source: Journal of Applied Physics
appears in collectionsFIS - Artigos
I3N - Artigos

files in this item

file description sizeformat
JAPL.pdfversão pdf do editor1.19 MBAdobe PDFview/open
statistics

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

 

Valid XHTML 1.0! RCAAP OpenAIRE DeGóis
ria-repositorio@ua.pt - Copyright ©   Universidade de Aveiro - RIA Statistics - Powered by MIT's DSpace software, Version 1.6.2