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 Precursor chemistry: remaining challenges and some novel approaches
Please use this identifier to cite or link to this item http://hdl.handle.net/10773/5724

title: Precursor chemistry: remaining challenges and some novel approaches
authors: O' Brien, P.
Malik, M. A.
Chunggaze, M.
Trindade, T.
Walsh, J. R.
Jones, A. C.
issue date: Jan-1997
publisher: Elsevier
abstract: In this short paper an outline of the properties of an ideal precursor for MOCVD is given. Two systems are then used to explain the advantages of novel precursor systems over conventional ones, for the deposition of electrically important materials. The first example concerns the use of the triethylamine adduct of dimethylzinc as a precursor either in the deposition of II/VI materials containing zinc or the doping of III/V materials. The second example concerns the development of thiocarbamato precursors of improved volatility and their use in the deposition of PbS a material whose deposition by MOCVD has been problematic.
URI: http://hdl.handle.net/10773/5724
ISSN: 0022-0248
source: Journal of Crystal Growth
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